LithoDreamer generative lithography / ILT
Generative and inverse correction of mask patterns accelerates OPC iteration and pattern convergence.
Benchmark architecture
LITHOGRAPHY
Photolithography equipment
Lithography
Linewidth, alignment and pattern fidelity are set at exposure and on the coat and develop track.
EQUIPMENT SCOPE
Equipment scope
- NIKON exposure tools, full product range
- CANON exposure tools, full range including nanoimprint
- TEL coat and develop tracks
- DNS coat and develop tracks
Focused on leading Japanese brands, covering full line configurations of exposure tools and coat and develop tracks.
SERVICES
Services provided
- Equipment procurement, evaluation and tool selection
- Tool condition inspection and acceptance support
- De-installation, packing and cross-border shipping
- Move-in installation, alignment and tuning
- Maintenance and spare parts planning
- Lithography process technology transfer
- Operator and maintenance staff training
AI INTEGRATION
AI integration
The third-party frontier architectures BETTER benchmarks and deploys.
Explainable GAT layout hotspot (ASP-DAC'26)
An 8-head graph attention network predicts layout hotspots and gives explainable reasoning.
Benchmark architecture
Coat and develop track digital twin
A virtual counterpart of the coat and develop track simulates condition changes and scheduling effects.
Benchmark architecture
USE CASES
Where it fits
- New lines that need exposure and track installed together
- Capacity expansion or tool relocation at an existing fab
- Research institutes building lithography capability
- Used-equipment buyers needing condition checks and reinstallation
GET IN TOUCH
Let's talk about your line
One point of contact from equipment selection through installation and AI integration.