DeepOHeat-v1 (2025)
A DeepONet and KAN thermal surrogate model rapidly predicts chamber and wafer heat distribution.
Benchmark architecture
CVD
CVD equipment
Chemical Vapor Deposition
Thin-film deposition that controls thickness uniformity and step coverage.
EQUIPMENT SCOPE
Equipment scope
- KOKUSAI ELECTRIC (KE) chemical vapor deposition equipment
- MATSUSHITA chemical vapor deposition equipment
Focused on leading Japanese brands, covering batch and single-wafer thin-film deposition equipment.
SERVICES
Services provided
- Equipment procurement, evaluation and tool selection
- Tool condition inspection and acceptance support
- De-installation, packing and cross-border shipping
- Move-in installation, gas line hookup and tuning
- Maintenance, consumables and spare parts planning
- Thin-film process technology transfer
- Operator and maintenance staff training
AI INTEGRATION
AI integration
The third-party frontier architectures BETTER benchmarks and deploys.
ThermEDGe / IREDGe
An encoder-decoder CNN predicts temperature contours and electrothermal coupling effects.
Benchmark architecture
Deposition chamber digital twin
A virtual counterpart of the deposition chamber simulates gas flow, temperature and thickness uniformity.
Benchmark architecture
USE CASES
Where it fits
- Lines needing better thickness uniformity and batch consistency
- Expansion projects adding thin-film process capability
- Furnace relocation and requalification
- Research institutes building thin-film deposition capability
GET IN TOUCH
Let's talk about your line
One point of contact from equipment selection through installation and AI integration.