LithoDreamer generative lithography / ILT
Generative and inverse methods produce mask pattern corrections that raise transfer fidelity.
Benchmark architecture
MASK / RETICLE
Photomask equipment
Mask / Reticle
The source of pattern quality for every downstream transfer step.
EQUIPMENT SCOPE
Equipment scope
- NUFLARE e-beam writer equipment
- JEOL e-beam and photomask related equipment
Focused on leading Japanese brands, covering mask writing and related process equipment.
SERVICES
Services provided
- Equipment procurement, evaluation and tool selection
- Tool condition inspection and acceptance support
- De-installation, packing and cross-border shipping
- Move-in installation, vibration environment check and tuning
- Electron optics and vacuum system maintenance
- Photomask process technology transfer
- Operator and maintenance staff training
AI INTEGRATION
AI integration
The third-party frontier architectures BETTER benchmarks and deploys.
MaxViT / U-Net (2026)
An encoder-decoder image model handles large pattern fields and locates risk areas quickly.
Benchmark architecture
Explainable GAT layout hotspot (ASP-DAC'26)
A graph attention network predicts hotspots at layout and feeds them back into mask correction.
Benchmark architecture
E-beam writing digital twin
Simulates write dose, proximity effects and write time to optimize the writing strategy.
Benchmark architecture
USE CASES
Where it fits
- Mask shops building or expanding writing capacity
- Projects raising pattern fidelity and correction efficiency
- E-beam tool relocation and environment rebuild
- Research institutes building e-beam writing capability
GET IN TOUCH
Let's talk about your line
One point of contact from equipment selection through installation and AI integration.